PVD deposição física de vapor

Prévia do material em texto

By Muhammad Ali Asghar 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Michael Faraday used PVD in 1838 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Deposition 
 Applying a thin film on a surface ranges from nano 
meters to micro meters. 
 Thin film is deposited on Substrates. 
 Different techniques are used for deposition PVD, 
CVD, sputtering, electroplating & coating. 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Physical vapor deposition 
Physical coating process involve, 
condensation & evaporation of material 
PVD is used for high melting point & low 
vapor pressure materials. 
 PVD is carried out at high temperature and 
vacuum. 
 In contrary to PVD, CVD is a method in which 
chemical adhesion or chemical deposition occurs. 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
High temperature 
is required to 
vaporize the material 
Vacuum of different 
ranges is used which 
depends on the mean 
free path required in 
the system. 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
PVD methods are commonly used in followings: 
Circuit & IC fabrications. 
Aerospace in TBC & transparent coatings. 
Reflectors and optics 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Evaporative deposition 
Electron beam vapor deposition 
Pulsed laser deposition 
Sputter deposition 
Ion induced deposition 
Cathode Arc Deposition 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Evaporative deposition 
Resistive heating method is used. 
deposition is performed at high 
temperature & low vacuum 
Vacuum decreases the content 
of Contamination 
Voltage & current is manually 
controlled. 
Material is kept in boats. 
 
 
 
 
 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Resistive heating unit 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Electron beam is generated 
by tungsten filament. 
Material is placed in 
Graphite or tungsten crucible 
Deposition mechanism is same 
 deposition is carried out 
 under high vacuum. 
Deposition is controlled, and 
Uniform 
 
 MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Pulsed laser deposition 
 High power laser is used for deposition. 
 Argon or neon is used for inert atmosphere. 
 High vacuum is formed 
 laser is focused by lens, target decides the position of 
the deposition . 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
Sputter deposition 
 Sputtering works on the bases of momentum principle, 
formed by the collision of the atoms and molecules. 
 Plasma glow, ion accelerator or radioactive emitting is 
used to evaporate material. 
 argon gas is used for inert atmosphere. 
 
 Types of sputtering 
 Chemical and etching sputtering 
 Electronic sputtering 
 Potential sputtering 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
 In this process ions are deposited 
on the substrates. 
 This process is used for IC 
fabrication, micro circuit printing 
nano printing or pattering . & 
lithography. 
 It will be discussed in detail with 
nano pattering. 
 MUHAMMAD ALI ASGHAR VC&ML NINVAST 
PVD advantages & Disadvantages 
 Environment friendly then 
paint & electroplating. 
 more than one PVD 
technique can be used for 
coating. 
 Usually topcoats are not 
required. 
 Good strength and 
durability. 
 Cooling systems are required. 
 Mostly high temperature and 
vacuum control needs skill & 
experience. 
 PVD coated materials has no 
chemical interaction with the 
surface that 
 
 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST 
MUHAMMAD ALI ASGHAR 
VC&ML NINVAST