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Problem 10.25PP
One of the steps in semiconductor wafer manufacturing during photolithography is performed by 
placement of the wafer on a heated plate for a certain period of time. Laboratory experiments 
have shown that the transfer function from the heater power, u, to the wafer temperature, y, is 
given by
^ = C(s) = __________ 2:5?__________ . .
u(s) (j + 0.19)(5 + 0.78)(s + 0.00018)
(a) Sketch the 180* root locus for the uncompensated system.
(b) Using the root-locus design techniques, design a dynamic compensator, Dc(s), such that the 
system meets the following time-domain specifications 
i. Mp