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Semiconductor Physics and Devices: Basic Principles, 4 th edition Chapter 10 By D. A. Neamen Problem Solutions ______________________________________________________________________________________ 10.4 p-type silicon (a) Aluminum gate fp g mms e E 2 We have i a tfp n N V ln 334.0 105.1 106 ln0259.0 10 15 V Then 334.056.025.320.3 ms or 944.0ms V (b) n polysilicon gate fp g ms e E 2 334.056.0 or 894.0ms V (c) p polysilicon gate 334.056.0 2 fp g ms e E or 226.0ms V _______________________________________ 10.5 3832.0 105.1 104 ln0259.0 10 16 fp V fp g mms e E 2 3832.056.025.320.3 9932.0ms V _______________________________________ 10.6 (a) 17102dN cm 3 (b) Not possible - ms is always positive. (c) 15102dN cm 3 _______________________________________ 10.7 From Problem 10.5, 9932.0ms V ox ss msFB C Q V (a) 8 14 10200 1085.89.3 ox ox ox t C 710726.1 F/cm 2 7 1910 10726.1 106.1105 9932.0 FBV 040.1 V (b) 8 14 1080 1085.89.3 oxC 710314.4 F/cm 2 7 1910 10314.4 106.1105 9932.0 FBV 012.1 V _______________________________________ 10.8 (a) 42.0ms V 42.0 msFBV V (b) 7 8 14 10726.1 10200 1085.89.3 oxC F/cm 2 (i) 7 1910 10726.1 106.1104 ox ss FB C Q V 0371.0 V (ii) 7 1911 10726.1 106.110 FBV 0927.0 V (c) 42.0 msFBV V 7 8 14 10876.2 10120 1085.89.3 oxC F/cm 2 (i) 7 1910 10876.2 106.1104 FBV 0223.0 V (ii) 7 1911 10876.2 106.110 FBV 0556.0 V _______________________________________