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Comparison of Approximate Formulas for the Capacitance of Microstrip Line Matthew N. O. Sadiku, Sarhan M. Musa College of Engineering Prairie View A&M University Prairie View, TX 77446 Email: sadiku@ieee.org, smmusa@pvamu.edu and Sudarshan R. Nelatury School of Engineering Penn State University, Erie Erie, PA 16563 Email: srn3@psu.edu Abstract In the development of CAD routines at rf or microwave frequencies, closed form models for the capacitance per unit length of microstrip interconnects are easily incorporated. Numerous formulas have been proposed based on analytical, numerical, and empirical approaches. When there are a host of formulas found in the literature, knowledge of their accuracy against measured values and a case study of comparison is all the more vital in the design practice. This paper considers 12 such closed form models published over the past four decades and makes a critical comparison and seeks a way of improving the accuracy. While new formulas are proposed that give rise to less % error compared to few others taken as reference, it is found that composite formulas inherit combined goodness from which they are derived. Our case study provides some interesting results. 1. Introduction Printed transmission lines such as microstrip lines are widely used because they provide circuits that are compact and light in weight. Also, its simple structure and ruggedness make it a good substitute for conventional coaxial and waveguides in several applications. However, the interconnect capacitance between junctions on a chip plays a major role in digital circuit performance. At frequencies above a few megahertz, the interconnect capacitance is heavily responsible for determining the characteristic impedance of the traces. Several attempts have been made to calculate the capacitance of microstrip line by rigorous numerical analysis. This type of computation is time-consuming when implemented in computer-aided design (CAD) programs. To overcome this situation, simple formulas which are accurate enough for engineering analysis have been proposed. Some of these formulas were compared by Bogatin [1] in 1988. Since then other models have been proposed. The purpose of this work is to improve and extend the work in [1]. This paper compares a variety of published models for calculating the capacitance per unit length for microstrip geometry shown in Fig. 1. For each model, we define the effective relative permittivity eff o C C ε = (1) and the line impedance eff o o Z u C ε= (2) where Co = capacitance per length when 1rε = , C = capacitance per unit length when filled with the material, and uo = speed of light in free space = 3 x 108 m/sec. Fig. 1 Microstrip geometry w t o rε ε h 1-4244-1029-0/07/$25.00 ©2007 IEEE. 427 In what follows, these models are written down in chronological order. Comparison is made with the bench mark of measurements reported in [1]. 2. Models We now present the twelve models for calculating the capacitance per unit length of the microstrip. They are presented in chronological order. The models presented here may readily be handled using a pocket calculator. They can be incorporated easily in CAD routines. Model 1: Parallel plate [2] o r wC h ε ε= (3) Model 2: Kaupp [3] 60 ln 5.98 eff o eff C hu w ε= ⎛ ⎞⎜ ⎟⎜ ⎟⎝ ⎠ (4) 0.475 0.67 0.8 eff r eff e w w t ε= + = + (5) Model 3: Schneider [4,2] 6 860 ln 4 , / 1 2.42 0.44 1 , / 1 eff o o eff h wu w hC w h w h h w h h w w ε ε ε ⎧⎪ ⎛ ⎞⎪ +⎜ ⎟⎪ ⎝ ⎠= ≤⎨⎪ ⎡ ⎤⎛ ⎞⎪ + − + − ≥⎢ ⎥⎜ ⎟⎪ ⎝ ⎠⎢ ⎥⎣ ⎦⎩ (6) where 0.51 1 101 2 2 r r eff h w ε εε −+ − ⎛ ⎞= + +⎜ ⎟⎝ ⎠ (7) Model 4: Kumar et al. [5] 2 4ln o eff wC hh t πε ε ⎡ ⎤⎢ ⎥⎢ ⎥= + ⎛ ⎞⎢ ⎥⎜ ⎟⎢ ⎥⎝ ⎠⎣ ⎦ (8) where 11 1 1 2 2 10 r r eff w t ε εε −+ − ⎛ ⎞= + +⎜ ⎟⎝ ⎠ (9) Model 5: Wheeler [6,10] 2 2 4 1 8 8 8ln 1 2 o eff eff eff eff C h h h w w w ε ε π = ⎧ ⎫⎡ ⎤⎛ ⎞ ⎛ ⎞ ⎛ ⎞⎪ ⎪⎢ ⎥+ + +⎜ ⎟ ⎜ ⎟ ⎜ ⎟⎨ ⎬⎜ ⎟ ⎜ ⎟ ⎜ ⎟⎢ ⎥⎪ ⎪⎝ ⎠ ⎝ ⎠ ⎝ ⎠⎢ ⎥⎣ ⎦⎩ ⎭ (10) where 2 2 4ln 1 1.10 eff t ew w t wh t π π ⎧ ⎫⎪ ⎪⎪ ⎪⎪ ⎪⎪ ⎪⎪ ⎪= + ⎨ ⎬⎪ ⎪⎡ ⎤⎪ ⎪⎢ ⎥⎛ ⎞⎪ ⎪⎢ ⎥+⎜ ⎟ ⎛ ⎞⎪ ⎪⎝ ⎠ ⎢ ⎥+⎜ ⎟⎪ ⎪⎢ ⎥⎝ ⎠⎣ ⎦⎩ ⎭ (11) 0.5 1 1 101 2 2 r r eff eff h w ε εε −⎛ ⎞+ −= + +⎜ ⎟⎜ ⎟⎝ ⎠ (12) Model 6: Poh et al. [7] For w/h ≤ 0.6, 2 2 (1 ) 18 1ln 0.041 0.454 16(1 ) o r r r r r hC h w ww w h h ε ε π εε ε ε += ⎧ ⎫⎡ ⎤−⎪ ⎪⎛ ⎞ ⎛ ⎞ ⎛ ⎞+ + −⎢ ⎥⎨ ⎬⎜ ⎟ ⎜ ⎟ ⎜ ⎟+⎝ ⎠ ⎝ ⎠ ⎝ ⎠⎢ ⎥⎪ ⎪⎣ ⎦⎩ ⎭ (13) and for w/h > 0.6, ( ) ( ) 1/ 2 2 21 1 2.230 4.554 4.464 3.89o r r r r w h h hC In h w w w ε ε ε επε ⎧ ⎫⎡ ⎤⎛ ⎞ ⎛ ⎞= − + − − − +⎨ ⎬⎜ ⎟ ⎜ ⎟⎢ ⎥⎝ ⎠ ⎝ ⎠⎣ ⎦⎩ ⎭ (14) 428 Model 7: Sakurai and Tamaru [8] 0.222 1.15 2.80o r w tC h h ε ε ⎛ ⎞⎛ ⎞= +⎜ ⎟⎜ ⎟⎜ ⎟⎝ ⎠⎝ ⎠ (15) Model 8: T. C. Edwards [9] For w/h < 3.3 1 2 11 0 4 1 1 1 42.78 10 2( 1) 16 2 2 1 2 r r r r h hC In In In w w ε πε ε ε ε π − − ⎡ ⎤⎧ ⎫ ⎛ ⎞⎛ ⎞−⎪ ⎪⎛ ⎞⎢ ⎥= × + + + − +⎨ ⎬ ⎜ ⎟⎜ ⎟⎜ ⎟⎢ ⎥+⎝ ⎠ ⎝ ⎠⎝ ⎠⎪ ⎪⎩ ⎭⎣ ⎦ (16) For w/h > 3.3 11 2 0 2 5.56 10 4 ( /16) 1 1 0.94 2 2 2 2 2 r r r rr w In In e e wC In In h h ε ε π ε ε π π π π πεε − ⎡ ⎤⎛ ⎞× ⎧ ⎫− + ⎛ ⎞= + + + + +⎢ ⎥⎜ ⎟ ⎨ ⎬⎜ ⎟⎝ ⎠⎩ ⎭⎢ ⎥⎝ ⎠⎣ ⎦ (17) where e = 2.7182818 Model 9: Abuelma’atti [11] ( )3 0.765 3.9 2.3553.355 1.108 0.00045 1 0.54 0.0236 wC b b h b b ε ⎡ ⎤⎢ ⎥= + − − + +⎢ ⎥⎣ ⎦ (18) where b=h/w, the aspect ratio. Model 10: Chow and Tang [12] nn r n r o Wh W C /1 8 2 1 9.0 ⎥⎥⎦ ⎤ ⎢⎢⎣ ⎡ ⎟⎠ ⎞⎜⎝ ⎛ ++⎟⎠ ⎞⎜⎝ ⎛= πεεε (19) with n= 1.114. Model 11: A.A. Shapiro [13] 1 0 1.393 0.667 1.444eff w wC In h h ε ε π −⎡ ⎤⎛ ⎞= + + +⎜ ⎟⎢ ⎥⎝ ⎠⎣ ⎦ (20) where ⎥⎥⎦ ⎤ ⎢⎢⎣ ⎡ ⎟⎠ ⎞⎜⎝ ⎛ −+⎟⎠ ⎞⎜⎝ ⎛ +−++= − 25.0 104.0121 2 1 2 1 h w w hrr eff εεε (21) Model 12: Kwok et al [14] 1/1.081.08 1.08 1( 1) 8 8ln 1 r o r w wC hh h w εε π ε ⎧ ⎫⎡ ⎤⎪ ⎪⎢ ⎥⎪ ⎪⎛ ⎞ ⎢ ⎥= + + −⎨ ⎬⎜ ⎟ ⎛ ⎞⎝ ⎠ ⎢ ⎥⎪ ⎪+⎜ ⎟⎢ ⎥⎪ ⎪⎝ ⎠⎣ ⎦⎩ ⎭ (22) Bogatin [1] made a comparison of the first six models. However, the remaining six models that have been proposed over the last eighteen years and are included in this paper. In the next section we shall make a comparison of these models. 3. Comparison of Models In order to compare the models 1-12 listed in the preceding section, we shall take recourse to the same measured values used by Bogatin in [1]. For the benefit of the reader, the details of the experimental specimens are restated from [1] as follows: A series of microstrips were fabricated using a sheet of Rogers Corporation Duroid 5880, Teflon printed circuit board, 0.125” thick. The manufacturer gives the dielectric constant εr in the range 2.178-2.222 with 2.2 as the nominal value. The board was clad on one side with 1 oz copper. On the other side, strips were laid down approximately 18” long of widths from 0.015” to 3”. About 9 choices of widths were made and accordingly 9 measurements made. The strips were composed of 1-mil- thick copper with a 2 mil thick layer of adhesive. The capacitance of these specimens was measured at 1KHz using IET Labs Inc. model IMF – 600 Impedance meter. The stray capacitance typically 1.0-2.0pF was measured with electrodes very close to the microstrip. This value was subtracted from each measurement. As for the uncertainty in measurements, it was stated that, there was less than ±1% in h, ±2% in w and ±1% in C. Also, any two models that agree with the data to better than 3%, are considered equivalent. The capacitance values thus tabulated were used in the comparison process. We 429 have used the norm of the relative error ||E|| as the error metric defined as: ∑ = ⎥⎦ ⎤⎢⎣ ⎡ −= N i Meaured CalculatedMeaured iC iCiC E 1 2 )( )()( (23) Figure 2 depicts the capacitance per unit length measured in pF per inch for all the 12 models. The measured values are shown by dots on each graph. Also the reader may note that each subplot in Figure 2 has a vertical bar whose height is proportional to the error to get a sense of relative goodness of each model. Note that for the model 2 the y axis limit goes all the way up to 100. Thus the error bar should be interpreted as highest for this model. 10-1 101 0 4 8 14 #1 10-1 101 0 100 #2 10-1 101 0 4 8 14 #3 10-1 101 0 4 8 14 #4 10-1 101 0 4 8 14 #5 10-1 101 0 4 8 14 #6 10-1 101 0 4 8 14 #7 10-1 101 0 4 8 14 #8 10-1 101 0 4 8 14 #9 10-1 101 0 4 8 14 #10 10-1 101 0 20 40 60 #11 10-1 101 0 4 8 14 width measured in inches C ap ac ita nc e in p F pe r i nc h #12 Figure 2. Capacitance per unit length measured in pF per inch in each of the 12 models. 430 #4 #8 #9 #11 0 0.5 1 1.5 2 2.5 3 3.5 4 4.5 5 Model number E rro r n or m original composite Figure 3. Showing the reduction in ||E|| by combining model 3 with other models 4, 8, 9 and 11 Table 1 shows the error norm in all these models. As can be seen, Schneider’s model has the least error, and that is followed by Wheeler’s model. Of all, the Kaupp’s model has the greatest error. The reason for this has to do with the term in the denominator. Whenever the ratio weff/h equals 5.98, we find a singularity because the denominator has log of unity. This would greatly offset the values and hence we get the highest error. In [1] Bogatin has made an excellent point that it is possible to make up a composite model taking εreff based on one model and C per unit length based on other model. In fact, the model 5 of Wheeler we have shown is one such with Schneider’s expression for εreff combined with it. With this idea in mind, we have tried to use Schneider’s expression in few other models viz., 4, 8, 9, and 11. The observation is indeed very interesting that the error norm has decreased. This is shown in the third column of the Table 1. The error norm is also shown by histogram plot in Figure 3 wherein we depict pair-wise comparison of models 4, 8, 9, & 11 with and without combining with model 3. Model 9 of Abuelma’atti coupled with Schneider’s model 3 for εreff has the least error. Even Shapiro’s model 11 gained significant accuracy by this composite approach. The error is reduced from 4.7115 to 0.2707. Table 1. Various models and the error norm in each. Note that the model 9 of Abuelma’atti combined with model 3 of Schneider has the least error in bold face as shown by an arrow. Model Error norm ||E|| Error norm ||E|| (composite model) # 1 Parallel plate 1.9380 # 2 Kaupp 13.1240 # 3 Schneider 0.0480 # 4 Kumar et al. 0.9632 0.8336 # 5 Wheeler 0.0656 # 6 Poh et al. 0.0724 # 7 Sakurai and Tamaru 0.2982 # 8 Edwards 0.2275 0.0760 # 9 Abuelma’atti 0.7152 0.0267 Å #10 Chow & Tang 0.9865 #11 Shapiro 4.7115 0.2707 #12 Kwok et al. 0.0851 431 4. Conclusion Capacitance per unit length of microstrip line specimens have been computed and compared with the measured values. Having a reliable closed form expression for the capacitance per unit length of microstrip line is very vital for the development of CAD tools. Several authors proposed models for the same. Bogatin made a comparison of various formulas for their accuracy against the real measurements. This paper is written for the furtherance of Bogatin’s work. In agreement with his observation, use of a composite model with the help of Schneider’s model has improved the accuracy. Other ways of combining the models could be examined. 5. References [1] E. Bogatin, “Design rules for microstrip capacitance,” IEEE Trans. Components, Hybrids, and Manufacturing Technology, vol. 11, no. 3, Sept. 1988, pp.253-259 [2] M. N. O. Sadiku, Elements of Electromagnetics. New York: Oxford Univ. Press, 4th ed., 2007, pp. 236, 553. [3] H. R. Knapp, “Characteristics of microstrip transmission lines,” IEEE Ttans. Energy Conversion, vol. EC-16, no. 2, April 1967, p. 185. [4] M. V. Schneider, “Microstrip lines for microwave integrated circuits,” Bell Systems Technical Journal, vol. 48, no. 5, May 1969, p. 1421. [5] A. Kumar et al, “A method for the calculation of the characteristic impedance of microstrips,” International Journal of Electronics, vol. 40, no.1, 1976, p. 45. [6] H. A. Wheeler, “Transmission line properties of a strip on a dielectric sheet on a plane,” IEEE Trans. Microwave Theory and Techniques, vol. MTT-25, no. 8, Aug. 1977, p. 631. [7] S. Y. Poh, W. C. Chew, and J. A. Kong, “Approximate formulas for line capacitance and characteristic impedance of microstrip line,” IEEE Trans. Microwave Theory and Techniques, vol. MTT-29, Feb. 1981, p. 135-142; and the erratum in vol. MTT-29, no. 10, Oct. 1981, p. 1119. [8] T. Sakurai and K. Tamaru, “Simple formulas for two and three dimensional capacitances,” IEEE Trans. Electron Devices, vol. ED-30, no. 2, Feb. 1983, pp. 183-185. [9] T. C. Edwards, Foundations for Microstrip Circuit Design. New York: John Wiley & Sons, 1983, p.45. [10] E. Bogatin, “A closed form analytical model for the electrical properties of microstrip interconnects,” IEEE Trans. Components, Hybrids, and Manufacturing Technology, vol. 13, no. 2, June 1990, pp. 258-266. [11] M. T. Abuelma’atti, “An improved approximation to the microstrip line capacitance,” International Journal of Infrared and Millimeter Waves, vol. 13, no. 11, Nov. 1992, pp. 1795-1800. [12] Y.L.Chow and W.C.Tang, “CAD formulas of integrated circuit components by Fuzzy Electromagnetics – Simplified formulation by rigorous derivation,” Proc. Antennas & Prop. Soc. Int’l. Sympo., 2000, vol.3, 16-21 July 200, pp.1566-1569. [13] A. A. Shapiro, M. L. Mecartney , and H. P. Lee,”A comparison of microstrip models to low temperature co-fired ceramic-silver microstrip measurements”, Microelectronics Journal, no. 33, Jan. 2002, pp. 443-447. [14] S. K. Kwok, K. F. Tsang, and Y. L. Chow, “A novel capacitance formula of the microstrip line using synthetic asymptote,” Microwave and Optical Technology Letters, vol. 36, no. 5, March 2003, pp. 327-330. 432 View publication statsView publication stats
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