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Semiconductor Physics and Devices: Basic Principles, 4 th edition Chapter 14 By D. A. Neamen Problem Solutions ______________________________________________________________________________________ Chapter 14 14.1 gE 24.1 max m (a) Si: 11.1 12.1 24.1 max m (b) Ge: 88.1 66.0 24.1 max m (c) GaAs: 873.0 42.1 24.1 max m (d) InP: 919.0 35.1 24.1 max m _______________________________________ 14.2 (a) For 480 nm, 58.2 480.0 24.124.1 E eV For 725 nm, 71.1 725.0 24.1 E eV (b) For 87.0E eV, 43.1 87.0 24.124.1 E m For 32.1E eV, 939.0 32.1 24.1 m For 90.1E eV, 653.0 90.1 24.1 m _______________________________________ 14.3 (a) 752.0 65.1 24.1 m (i) From Figure 14.4, 3109 cm 1 (ii) d I dI exp 0 43 102.1109exp 340.0 Fraction absorbed 66.034.01 (b) 653.0 90.1 24.1 m (i) From Figure 14.4, 4106.2 cm 1 (ii) d I dI exp 0 44 1080.0106.2exp 125.0 Fraction absorbed 875.0125.01 _______________________________________ 14.4 h xI g For 3.1h eV, 95.0 3.1 24.1 m For silicon: 2103 cm 1 Then for 210xI W/cm 2 , we obtain 3.1106.1 10103 19 22 g or 191044.1 g cm 3 s 1 The excess concentration is 619 101044.1 gn or 131044.1 n cm 3 _______________________________________ 14.5 (a) 0 0 p p p ggp 22 7 15 105.2 102 105 g cm 3 s 1 For 65.1h eV, 752.0 65.1 24.1 m From Figure 14.4, 3109 cm 1 hg I 0 3 1922 109 65.1106.1105.2 733.0 W/cm 2